THE ANALYSIS OF MONOPOLE ANTENNAS LOCATED ON A SPHERICAL VEHICLE. I. THEORY. = ANALYSE D'ANTENNES UNIPOLAIRES SITUEES SUR UN VEHICULE SPHERIQUE. I. THEORIETESCHE FM; NEUREUTHER AR.1976; I.E.E.E. TRANS. ELECTROMAGN. COMPATIB.; U.S.A.; DA. 1976; VOL. 18; NO 1; PP. 2-8; BIBL. 16 REF.Article

MUTUAL COUPLING IN LINEAR DIPOLE ARRAYSSCHERER JP; NEUREUTHER AR.1972; I.E.E.E. TRANS. ANTENNAS PROPAG.; U.S.A.; DA. 1972; VOL. 20; NO 5; PP. 651-653; BIBL. 16 REF.Serial Issue

EXPLORATION OF ELECTRON-BEAM WRITING STRATEGIES AND RESIST DEVELOPMENT EFFECTROSENFIELD MG; NEUREUTHER AR.1981; IEEE TRANSACTIONS ON ELECTRON DEVICES; ISSN 0018-9383; USA; DA. 1981; VOL. 28; NO 11; PP. 1289-1294; BIBL. 11 REF.Article

OPTICAL REQUIREMENTS FOR PROJECTION LITHOGRAPHYOLDHAM WG; SUBRAMANIAN S; NEUREUTHER AR et al.1981; SOLID-STATE ELECTRON.; ISSN 0038-1101; GBR; DA. 1981; VOL. 24; NO 10; PP. 975-980; BIBL. 17 REF.Article

MONTE-CARLO SIMULATION OF REGISTRATION SIGNALS FOR ELECTRON BEAM MICROFABRICATIONYI CHING LI; ILESANMI ADESIDA; NEUREUTHER AR et al.1980; APPL. PHYS. LETT.; ISSN 0003-6951; USA; DA. 1980; VOL. 36; NO 8; PP. 672-674; BIBL. 18 REF.Article

APPLICATION OF LINE-EDGE PROFILE SIMULATION TO THIN-FILM DEPOSITION PROCESSESNEUREUTHER AR; TING CH; CHEN YIH LIU et al.1980; IEEE TRANS. ELECTRON. DEVICES; ISSN 0018-9383; USA; DA. 1980; VOL. 27; NO 8; PP. 1449-1455; BIBL. 6 REF.Article

INFLUENCE OF AXIAL CHROMATIC ABERRATION IN PROJECTION POINTINGJAIN PK; NEUREUTHER AR; OLDHAM WG et al.1981; IEEE TRANSACTIONS ON ELECTRON DEVICES; ISSN 0018-9383; USA; DA. 1981; VOL. 28; NO 11; PP. 1410-1416; BIBL. 18 REF.Article

THE ANALYSIS OF MONOPOLE ANTENNAS LOCATED ON A SPHERICAL VEHICLE. II. NUMERICAL AND EXPERIMENTAL RESULTS. = ANALYSE D'ANTENNES UNIPOLAIRES SITUEES SUR UN VEHICULE SPHERIQUE. II. RESULTATS NUMERIQUES ET EXPERIMENTAUXTESCHE FM; NEUREUTHER AR; STOVALL RE et al.1976; I.E.E.E. TRANS. ELECTROMAGN. COMPATIB.; U.S.A.; DA. 1976; VOL. 18; NO 1; PP. 8-15; BIBL. 9 REF.Article

MODELING PROJECTION PRINTING OF POSITIVE PHOTORESISTS.DILL FH; NEUREUTHER AR; TUTTLE JA et al.1975; I.E.E.E. TRANS. ELECTRON DEVICES; U.S.A.; DA. 1975; VOL. 22; NO 7; PP. 456-464; BIBL. 6 REF.Article

A GENERAL SIMULATOR FOR VLSI LITHOGRAPHY AND ETCHING PROCESSES. II: APPLICATION TO DEPOSITION AND ETCHINGOLDHAM WG; NEUREUTHER AR; CHIAKANG SUNG et al.1980; IEEE TRANS. ELECTRON. DEVICES; ISSN 0018-9383; USA; DA. 1980; VOL. 27; NO 8; PP. 1455-1459; BIBL. 9 REF.Article

A GENERAL SIMULATOR FOR VLSI LITHOGRAPHY AND ETCHING PROCESSES. II: APPLICATION TO DEPOSITION AND ETCHINGOLDHAM WG; NEUREUTHER AR; CHIAKANG SUNG et al.1980; IEEE J. SOLID-STATE CIRCUITS; ISSN 0018-9200; USA; DA. 1980; VOL. 15; NO 4; PP. 520-524; BIBL. 9 REF.Article